Chipmetrics

🔎 Scaling ALD from Lab to Fab: Key Challenges & Solutions. As semiconductor devices evolve, 3D structures like 3D NAND, TSVs, and nanosheet transistors demand high aspect ratio ALD processes. But scaling ALD from research to industry isn’t straightforward. 🚧 Key challenges: ⚡ Lab vs. Fab Mismatch – Process behavior changes when scaling from research tools to high-volume manufacturing. ⚡ Throughput & Cost – Slow deposition rates can make processes too expensive for industrial adoption. ⚡ Defect Control – Even tiny particles can compromise yield, but many research labs lack advanced defect detection. ⚡ Test Structure Limitations – Access to sub-100 nm, high-aspect-ratio structures is restricted, making validation difficult. 🔬 PillarHall® Metrology Chips help overcome these challenges with aspect ratios up to 10,000:1, enabling fast, cost-effective ALD validation without cross-sections. 👇Read more from the link in the first comment. #ALDep #Chipmetrified #PillarHall #TestedWithPillarHall #Semiconductor

📢 At ALD for Industry in Dresden this week: our friends at ENCAPSULIX will present how the PillarHall test chips help it deposit decorative coatings in luxury goods. Make sure to check out the presentation by Jacques Kools, held on March 12th, 14:50,during Session 6 on Efficiency and Throughput Optimization. #ALDep #PillarHall #TestedWithPillarHall #Chipmetrified

🚀 Stay ahead of the competition with faster and more efficient tool qualification! The PillarHall series of test chips is designed to accelerate tool qualification, reduce costs, and help you get new tools up and running quickly—whether they’re brand new or freshly maintained. By offering objective, unbiased data and early detection of process shifts, PillarHall test chips help streamline your qualification cycles, empower procurement decisions, and reduce waste—boosting both productivity and sustainability. Plus, with high aspect ratio features designed for advanced nodes, you’ll be ready for tomorrow's technologies. Read the full article from the link in the first comment 👇 #ALDep #ALD #TestedWithPillarHall #PillarHall #Chipmetrified

🚀 Chipmetrics at ALD for Industry & Namlab High K Workshop 2025! 🚀 Chipmetrics is participating in two exciting events this March! 🔬 ALD for Industry (March 11-12, 2025, Dresden, Germany) We will be attending the event where we will present our latest research on the elemental composition of ALD films as a function of penetration depth. The study includes investigations into the La-doped HfO2 process and the unique characteristics of ferroelectric HfO2 films. Additionally, we will showcase how the PillarHall method successfully extends advanced surface analysis to 3D structures. This research is the result of a fantastic collaboration with Dr. Jennifer S. Emara, Dr. Nora Haufe, and the Fraunhofer Institute for Photonic Microsystems IPMS team. 🎤 Namlab High K Workshop 2025 (March 12-13, 2025, IFW Dresden) We will also be participating in the Namlab High K Workshop, where we’ll be networking with industry leaders and discussing our latest developments. 📍 If you are attending come visit us at both events to learn more about our cutting-edge solutions for 3D thin film characterization challenges! #ALDep #ThinFilms #TestedWithPillarHall #PillarHall #Chipmetrified

As device nodes keep shrinking, the race to seamlessly fill nanometer-scale features is on. Traditional atomic layer deposition (ALD) provides excellent precision, but doesn’t achieve the “V-shaped” coverage needed for super conformal films. A Linköping University team led by Professor Henrik Pedersen explored a new solution: adding a heavy inert gas–like krypton–to enhance diffusion on our PillarHall test chips. In tests, introducing krypton (Kr)increased the step coverage in high-aspect-ratio (18:1) features from 1 to 1.6 for aluminum nitride (AlN) deposition. The results show that the heavier Kr helps push lighter ammonia (NH3)molecules deeper into trenches, improving coverage at the bottom and reducing growth at the opening. While more research is needed to fully understand Kr’s role, this strategy could apply broadly to many ALD processes–opening exciting possibilities for next-generation device manufacturing and demonstrating how Chipmetrics enables cutting-edge research. Read the full paper at ACS Publications: https://lnkd.in/evy954zm #ALD #ALDep #Innovation #Nanotechnology #Semiconductors #ResearchAndDevelopment #PillarHall #TestedWithPillarHall #Chipmetrified

🔹 SEMICON Korea 2025 – Day 3: Featuring PillarHall® LHAR5🔹 It’s the final day of SEMICON Korea 2025, and today our PillarHall® LHAR5 advanced test chip for thin-film metrology in high aspect ratio (HAR) structures is on display!🚀 💡 Why PillarHall® LHAR5? ✅ Accurate conformality measurements in HAR structures ✅ Supports various analytical techniques ✅ Enables rapid process optimization If you’re at COEX, Seoul, stop by Advantec Korea booth C.244 to see PillarHall® LHAR5 in action and discuss with our CEO, Mikko Utriainen, how it supports the development of ferroelectric thin films for future semiconductor 3D devices. #SEMICONKorea2025 #Chipmetrified #PillarHall #ALDep #PillarHall #TestedWithPillarHall

🔹SEMICON Korea 2025 – Day 2: Explore the ASD-1 Test Chip!🔹 Day 2 of SEMICON Korea 2025 is in full swing, and we’re excited to showcase one of our key innovations—the Area Selective Deposition (ASD-1) Test Chip! 💡 Why the ASD-1 Test Chip? ✅ Designed for precise Area-Selective Deposition (ASD) process evaluation ✅ Accelerates R&D by enabling rapid ASD process optimization ✅ Multiple material combinations available for various ASD applications 📍 Visit Advantec Korea Co., Ltd. at Booth C.244 to explore the ASD-1 Test Chip and learn how Chipmetrics is driving next-generation thin-film metrology solutions! #ALDep #PillarHall #Chipmetrified #SemiconKorea2025 #Semiconductor

🎉 SEMICON Korea 2025 Begins Today! 🎉 SEMICON Korea 2025 is officially underway at COEX, Seoul! 🚀 Join us over the next three days as we showcase cutting-edge metrology solutions for semiconductor manufacturing tool qualification. Find Chipmetrics at Booth C.244! We’re represented by Advantec Korea Co., Ltd.—stop by to explore our latest innovations! #ALDep #SemiconKorea2025 #Semiconductor #3DMetrology #PillarHall #Chipmetrified

🌟 Introducing the Next-Gen Solution for Semiconductor Process Control: PillarHall LHAR5 Test Chip 🌟 In today’s semiconductor landscape, every nanometer counts. The competition is fierce, and the need for faster tool qualification, higher yields, and sustainable manufacturing has never been more urgent. That’s why we’re thrilled to announce the launch of the fifth-generation PillarHall test chip: LHAR5 – a major leap forward in process control innovation. 🚀 Key Improvement: The gap height in LHAR5 has been reduced to 100 nanometers from 500 nanometers, offering unprecedented sensitivity to meet today’s advanced node challenges. Here’s how LHAR5 empowers you to stay ahead: 🔍 Early Detection of Process Shifts Identify and correct subtle deposition process deviations before they impact yield, reducing scrap and costly rework. 📊 Vendor-Agnostic, High-Quality Data Fair benchmarking across tools and suppliers enables objective decision-making with universal compatibility across equipment. ⏱️ Accelerated Tool Qualification Shorten tool qualification cycles, getting you to high-volume manufacturing faster and more efficiently. 🌱 Support for Sustainable Production Reduce waste and optimize resource usage through precise monitoring and control, contributing to lower carbon footprints. 🔧 Futureproof for Advanced Nodes Designed for extreme aspect ratios and complex 3D structures, LHAR5 is ready for the next generation of 3D NAND and DRAM process requirements. With the PillarHall LHAR5, you gain the visibility, data, and control needed to accelerate innovation, minimize risks, and lead the charge in sustainable semiconductor manufacturing. 📩 Want to learn more or see it in action? Contact us today to explore how LHAR5 can revolutionize your process control strategy! Read full article from the link in the first comment 👇 #ALDep #PillarHall #TestedWithPillarHall #Semiconductor #Chipmetrified

 🚀Chipmetrics Profiles: Spotlight on Professor Henrik Pedersen, Linköping University In our first Chipmetrics Profile, we feature Professor Henrik Pedersen from Linköping University, one of Sweden’s foremost experts in ALD and CVD. With nearly 20 years of experience, he has made groundbreaking advancements in semiconductor process control and material deposition. His work with the Chipmetrics PillarHall test chip has transformed how researchers measure deposition uniformity and step coverage, providing insights previously unattainable with traditional methods. A key breakthrough in his research involves using heavy inert gases, like xenon, to improve deposition in confined spaces. This innovation enhances step coverage and material quality at higher temperatures, leading to a new phenomenon known as superconformal ALD, where growth accelerates at the bottom of deep structures.  The PillarHall test chip was crucial in validating these findings, which were published in Nature Communications. Professor Pedersen’s pioneering efforts demonstrate how cutting-edge tools like PillarHall are driving precision and innovation in semiconductor technology.       Read the full story form the link in comment 👇 #PillarHall #TestedWithPillarHall #Chipmetrified #ALDep Photo: Olov Planthaber, Linköping University